Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge
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Feb 24, 2017
About this article
Published Online: Feb 24, 2017
Page range: 173 - 180
Received: Jul 05, 2016
Accepted: Jan 05, 2017
DOI: https://doi.org/10.1515/msp-2017-0022
Keywords
© 2017 A. Kavitha, R. Kannan, S. Rajashabala
This article is distributed under the terms of the Creative Commons Attribution Non-Commercial License, which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Kavitha, A.
Department of Physics, University College of Engineering, Anna UniversityDindigul, India
Kannan, R.
Department of Physics, University College of Engineering, Anna UniversityDindigul, India
Rajashabala, S.
School of Physics, Madurai Kamaraj UniversityMadurai, India